In this paper we present the synthesis and optical properties of amorphous low molecular compound 4-((4-(bis(5,5,5-Triphenylpentyl)amino)phenyl)diazenyl)benzoic acid. The surface relief gratings formation by polarization holography method on these thin films (thicknesses are 200-1700 nm) was shown. The dependence of the surface relief modulation on various parameters: recording exposure dose, the polarization state of the recording beams, the grating period and the film thickness of the material was demonstrated. Values of surface tension at the air-film before and after irradiation of the substance by polarized radiation were measured. The efficiency of surface relief formation in different medium was compared. The possibility of practical application of 4-((4-(bis(5,5,5-Triphenylpentyl)amino)phenyl)diazenyl)benzoic acid in the holography as a non-etching photoresist was showed.